| Uy, A., H. Salami, A. Vadapalli, C. Grob, V. Dwivedi, and R. A. Adomaitis, “Process development for atomic layer deposition of aluminum ō¸°€fluoride using a trimethylaluminum and titanium (IV) ō¸°€fluoride precursor system,” Submitted for publication (2019) |
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| Salami, H., A. Uy, A. Vadapalli, C. Grob, V. Dwivedi, and R. A. Adomaitis, “Atomic layer deposition of ultra-thin indium oxide and indium tin oxide films using a trimethylindium, tetrakis(dimethylamino)tin, and ozone precursor system,” J. Vac. Sci. Tech. A 37 010905 (2019) DOI: 10.1116/1.5058171 |
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| Alobaid, A., C. S. Wang, and R. A. Adomaitis, “Mechanism and kinetics of HER and OER on NiFe LDH films in an alkaline electrolyte,” J. Electrochem. Soc. 165 (2018) J3395-3404 DOI: 10.1149/2.0481815jes |
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| Adomaitis, R. A. “Estimating the thermochemical properties of trimethylaluminum for thin-film processing applications,” J. Vac. Sci. Tech. A 37 (2018) 050602 DOI: 10.1116/1.5045342 |
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| Alobaid, A., H. Salami, and R. A. Adomaitis, “On the computation and interpretation of semi-positive reaction network invariants,” Computers & Chem. Eng. 117 (2018) 236-248 DOI: 10.1016/j.compchemeng.2018.06.009 |
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| Alobaid, A. and R. A. Adomaitis, “Monte Carlo simulation for optimal solar cell configuration,” Proceedings of PSE 2018, (2018) |
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| Adomaitis, R. A. and K. M. Ng, “Advanced manufacturing in chemical engineering,” Chem. Eng. Progress, October, (2017) 77 |
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| Salami, H., K. Ramakrishnan, and R. A. Adomaitis, “Reaction path analysis for chemical vapor deposition and atomic layer deposition processes: A study of titania thin-fi lm deposition,” Physica Status Solidi B, (2017) DOI: 10.1002/pssb.201700091 |
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| Adomaitis, R. A. “Reaction path analysis for atomic layer deposition processes,” Proc. FOCAPO / CPC 2017, Tucson, AZ, (2017) |
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| Salami, H., A. Poissant, and R. A. Adomaitis, “Anomalously high alumina atomic layer deposition growth per cycle during trimethylaluminum under-dosing conditions,” J. Vac. Sci. Tech. A 35 (2017) 01B101 DOI: 10.1116/1.4963368 |
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| Adomaitis, R. A. “Dynamic dimension reduction for thin-film deposition reaction network models,” Proc. IFAC DYCOPS-CAB 2016, Trondheim, Norway (2016) 448-453 |
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| Adomaitis, R. A. “Dynamic order reduction of thin-film deposition kinetics models: A reaction factorization approach,” J. Vac. Sci. Tech. A 34 (2016) 01A104 DOI: 10.1116/1.4930591 |
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| Adomaitis, R. A. “Time-scale analysis of atomic layer deposition processes: Predicting the transition from mass-transfer to kinetically limited regimes,” Physica Status Solidi C, 12 (2015) 934-943, DOI: 10.1002/pssc.201510048 |
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| Remmers, E. M., C. D. Travis, and R. A. Adomaitis, “Reaction factorization for the dynamic analysis of atomic layer deposition kinetics,” Chemical Engineering Science 127 (2015) 374-391 DOI: 10.1016/j.ces.2015.01.051 |
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| Travis, C. D. and R. A. Adomaitis, “Modeling Alumina Atomic Layer Deposition Reaction Kinetics During the Trimethylaluminum Exposure,” Theoretical Chemistry Accounts 133 (2013) 1414, DOI: 10.1007/s00214-013-1414-0 |
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| Travis, C. D. and R. A. Adomaitis, “Dynamic Modeling for the Design and Cyclic Operation of an Atomic Layer Deposition (ALD) Reactor,” Processes 1 (2013) 128-152, DOI: 10.3390/pr1020128 |
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| Travis, C. D. and R. A. Adomaitis, “Modeling ALD Surface Reaction and Process Dynamics using Absolute Reaction Rate Theory,” Chemical Vapor Deposition 19 (2013) 4-14, DOI: 10.1002/cvde.201206985 |
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| Adomaitis, R. A. and A. Schwarm “Systems and Control Challenges in Photovoltaic Manufacturing Processes: A Modeling Strategy for Passivation and Anti-reflection Films,” Computers & Chem. Eng. 51 (2013) 65-76, DOI: 10.1016/j.compchemeng.2012.06.043 |
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| Adomaitis, R. A. “A Ballistic Transport and Surface Reaction Model for Simulating Atomic Layer Deposition Processes in High Aspect-Ratio Nanopores,” Chemical Vapor Deposition, 17 (2011) 353-365, DOI: 10.1002/cvde.201106922 |
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| Adomaitis, R. A. “Ballistic Transport and Reaction Modeling of Atomic Layer Deposition Manufacturing Processes,” Proc. 2011 IFAC World Congress, Milan (2011) |
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| Arana-Chavez, D., E. Toumayan, F. Lora, C. McCaslin, and R. A. Adomaitis “Modeling the Transport and Reaction Mechanisms of Copper Oxide CVD,” Chemical Vapor Deposition 16 (2010) 336-345, DOI: 10.1002/cvde.201006873 |
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| Adomaitis, R. A. “Development of a Multiscale Model for an Atomic Layer Deposition Process,” J. Crystal Growth 312 (2010) 1449-1452, DOI: 10.1016/j.jcrysgro.2009.12.041 |
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| Guglietta, G. T. Wanga, R. Pati, S. Ehrman, and R. A. Adomaitis “Chemical Vapor Deposition of Copper Oxide Films for Photoelectrochemical Hydrogen Production,” Proc. of SPIE Vol. 7408 740807-1, Solar Hydrogen and Nanotechnology IV, F. Osterloh, Ed. (2009) |
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| Dwivedi, V. and R. A. Adomaitis “Multiscale Simulation and Optimization of an Atomic Layer Deposition Process in a Nanoporous Material,” ECS Transactions 25 (2009) 115-122, DOI: 10.149/1.3207582 |
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| Leon, M. del Pilar and R. A. Adomaitis “Full Wafer Mapping and Response Surface Modeling Techniques for Thin Film Deposition Processes,” J. Crystal Growth 311 (2009) 3399-3408 |
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| Oliver, J. D., B. H. Ponczak, R. P. Parikh, and R. A. Adomaitis “Uniformity Improvement of Planetary Epitaxial Growth Processes through Analysis of Intentionally Stalled SiC Wafers,” Mat. Sci. Forum, 615-617 (2009) 101-104 |
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| Adomaitis, R. A. “The Nearest Uniformity Producing Profile (NUPP) Optimization Criterion for Thin-Film Processing Applications,” J. Process Control 18 (2008) 922-930 |
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| Sreenivasan, R., R. A. Adomaitis, and G. W. Rubloff “A Comparative Study of Reactor Designs for the Production of Graded Films with Applications to Combinatorial CVD,” J. Crystal Growth 310 (2008) 270-283 |
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| Adomaitis, R. A. “Intentionally Patterned and Spatially Non-Uniform Film Profiles in Chemical Vapor Deposition Processes,” Surface and Coatings Technology 201 (2007) 9025-9029 |
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| Cai, Y., L. Henn-Lecordier, G. W. Rubloff, R. Sreenivasan, J.-O. Choo, and R. A. Adomaitis, “Multiplexed Mass Spectrometric Sensing in a Spatially Programmable Chemical Vapor Deposition System,” J. Vac. Sci. Tech. B 25 (2007) 1288-1297 |
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| Adomaitis, R. A., I. G. Kevrekidis, and R. de la Llave, “A Computer-Assisted Study of Global Dynamic Transitions for a Non-Invertible System,” Int. J. Bifurcation Chaos 17 (2007) 1305-1321 |
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| Adomaitis, R. A. “The Trouble with Spurious Eigenvalues,” Int. J. Bifurcation Chaos 17 (2007) 1375-1381 |
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| Parikh, R. P., R. A. Adomaitis, J. D. Oliver, and B. H. Ponczak “Implementation of a Geometrically-based Criterion for Film Uniformity Control in a Planetary SiC CVD Reactor System,” J. Process Control 17 (2007) 477-488 |
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| Parikh, R. P., R. A. Adomaitis, M. E. Aumer, D. Partlow, D. Thomson, and G. W. Rubloff, “Validating Gallium Nitride Growth Kinetics Using a Precursor Delivery Showered as a Novel Chemical Reactor,” J. Crystal Growth 296 (2006) 15-26 |
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| Sreenivasan, R. R. A. Adomaitis, and G. W. Rubloff, “A Demonstration of Spatially Programmable Chemical Vapor Deposition: Model-Based Uniformity/Non-uniformity Control.” J. Vac. Sci. Tech. B 24 (2006) 2706-2715 |
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| Chen, J. and R. A. Adomaitis “An Object-Oriented Framework for Modular Chemical Process Simulation with Semiconductor Processing Applications,” Computers & Chem. Eng., 30 (2006) 1354-1380 |
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| Parikh, R. P. and R. A. Adomaitis “An Overview of Gallium Nitride Growth Chemistry and its Effect on Reactor Design: Application to a Planetary Radial-Flow CVD System,” J. Crystal Growth 286 (2006) 259-278 |
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| Cho, S. G. W. Rubloff, M. E. Aumer, D. B. Thomson, D. P. Partlow, R. Parikh, and R. A. Adomaitis “In-situ Chemical Sensing in AlGaN/GaN HEMT MOCVD Process for Real-Time Prediction of Product Crystal Quality and Advanced Process Control,” J. Vac. Sci. Tech. B 23 (4) (2005) 1386-1397 |
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| Choo, J. O., R. A. Adomaitis, L. Henn-Lecordier, Y. Cai, and G. W. Rubloff “Development of a Spatially Controllable Chemical Vapor Deposition Reactor with Combinatorial Processing Capabilities,” Review of Scientific Instruments, 76, 062217 (2005) |
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| Adomaitis, R. A. “Identification of a Deposition Rate Profile Subspace Corresponding to Spatially-Uniform Films in Planetary CVD Reactors: A New Criterion for Uniformity Control,” Computers & Chem. Eng., 29 (2005) 829-837 |
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| Choo, J. O., R. A. Adomaitis, G. W. Rubloff, L. Henn-Lecordier, and Y. Liu “Simulation-Based Design and Experimental Evaluation of a Spatially Controllable Chemical Vapor Deposition Reactor,” AIChE Journal, 51 (2005) 572-584. |
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| Adomaitis, R. A. “A Reduced-Basis Discretization Method for Chemical Vapor Deposition Reactor Simulation,” Mathematical and Computer Modeling, 38 (2003) 159-175 |
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| Adomaitis, R. A. “Objects for MWR,” Computers & Chem. Eng., 26 (2002) 981-998 |
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| Adomaitis, R. A. “Spectral Filtering for Improved Performance of Collocation Discretization Methods,” Computers & Chem. Eng., 25 (2001) 1621-1632 |
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| Lin, Y.-h. and R. A. Adomaitis, “Simulation and Model Reduction Methods for an RF Plasma Glow Discharge,” Journal of Computational Physics, 171 (2001) 731-752 |
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| Chang, H. -Y., R. A. Adomaitis, J. N. Kidder, Jr., and G. W. Rubloff, “Influence of Gas Composition on Wafer Temperature in a Tungsten Chemical Vapor Deposition Reactor: Experimental Measurements, Model Development, and Parameter Estimation,” J. Vac. Sci. Tech. B, 19 (2001) 230-238; also ISR TR 2000-09 |
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| Rico-Martinez, R., R. A. Adomaitis, and I. G. Kevrekidis, “Noninvertibility in Neural Networks,” Computers & Chem. Eng., 24 (2000) 2417-2433 |
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| Adomaitis, R. A. and Y. -h. Lin, “A Collocation/Quadrature-Based Sturm-Liouville Problem Solver,” Applied Math. and Computation, 110 (2000); 205-223; also ISR TR 99-1 |
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| Adomaitis, R. A., Y. -h. Lin, and H. -Y. Chang, “A Computational Framework for Boundary-Value Problem Based Simulations,” Simulation, 74 (2000) 28-38. |
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| Lin, Y. -h., H. -Y. Chang, and R. A. Adomaitis, “MWRtools: A Library for Weighted Residual Method Calculations” Computers & Chem. Eng., 23 (1999) 1041-1061; also ISR TR 98-24 |
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| Theodoropoulou, A., E. Zafiriou, and R. A. Adomaitis, “Inverse Model Based Real-Time Control for Temperature Uniformity of RTCVD,” IEEE Trans. Semicond. Manuf., 12 (1999) 87-101. |
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| Chang, H. -Y. and R. A. Adomaitis, “Analysis of Heat Transfer in a Chemical Vapor Deposition Reactor: An Eigenfunction Expansion Solution Approach,” Int. J. Heat Fluid Flow, 20 (1999) 74-83; also ISR TR 97-84 |
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| Lin, Y. -h. and R. A. Adomaitis, “A Global Basis Function Approach to DC Glow Discharge Simulation,” Phys. Lett. A, 243 (1998) 142-150; also ISR TR 97-81 |
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| Adomaitis, R. A. and Y. -h. Lin, “A Technique for Accurate Collocation Residual Calculations,” Chem. Engng J., 71 (1998) 127-134; also ISR TR 98-6 |
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| Theodoropoulou, A., R. A. Adomaitis, and E. Zafiriou, “Model Reduction for RTCVD Optimization,” IEEE Trans. Semicond. Manuf. 11 (1998) 85-98 |
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Numerical Methods for Chemical Engineers: A MATLAB-based Approach by Raymond A. Adomaitis is licensed under a Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International License