Our recent paper Anomalously high alumina atomic layer deposition growth per cycle during trimethylaluminum under-dosing conditions by Hossein Salami, Andrew Poissant and Raymond A. Adomaitis has made the “Most Read List for November 2016” of JVST A. In this paper we report on unexpectedly high atomic layer deposition (ALD) growth per cycle of spatially uniform alumina films during underdosing of the aluminum precursor – precisely the opposite of what one would expect. We postulated a potential deposition mechanism explaining this unusual growth. Follow-up work on an alternative reactor-specific hypothesis explaining this phenomenon is underway.

This is a brief posting to indicate that our research group website is migrating to a blog format to make maintenance of the site simpler.